Atomic Layer Deposition (ALD) Applications in Nanotechnology and Optics
The Atomic Layer Deposition is a process that deposits materials using chemical surface reactions that stop automatically when the surface is saturated. This natural stop point prevents buildup and inconsistency. The films are grown one step at a time, making ALD one of the most accurate thin-film technologies available. ALD is most effective when applied to surfaces that require deep coverage...
0 Yorumlar 0 hisse senetleri 38 Views 0 önizleme